FORMATION OF ULTRATHIN SINGLE-CRYSTAL SILICIDE FILMS ON SI - SURFACE AND INTERFACIAL STABILIZATION OF SI-NISI2 EPITAXIAL STRUCTURES

被引：427
作者：
TUNG, RT
GIBSON, JM
POATE, JM
机构：
来源：
PHYSICAL REVIEW LETTERS | 1983年 / 50卷 / 06期
关键词：
D O I：
10.1103/PhysRevLett.50.429
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：429 / 432
页数：4
相关论文
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