PHOTO-OXIDATIVE STABILITY OF ELECTRON-BEAM AND UV-CURED SI-ACRYLATE AND TRIACRYLATE RESINS - INFLUENCE OF RESIN INITIATOR STRUCTURE

被引:24
作者
ALLEN, NS [1 ]
ROBINSON, PJ [1 ]
WHITE, NJ [1 ]
SKELHORNE, GG [1 ]
机构
[1] DIAMOND SHAMROCK EUROPE LTD,RES & DEV LABS,MANCHESTER M30 0BH,ENGLAND
关键词
D O I
10.1016/0014-3057(84)90215-5
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
引用
收藏
页码:13 / 18
页数:6
相关论文
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