ELECTRICAL-PROPERTIES AND STRUCTURAL DEFECTS OF NI-CR THIN-FILMS

被引：20

作者：

BELUMARIAN, A

MANAILA, R

KORONY, G

CONSTANTIN, C

DEVENYI, A

机构：

[1] Inst of Physics & Technology of, Materials, Bucharest, Rom, Inst of Physics & Technology of Materials, Bucharest, Rom

来源：

THIN SOLID FILMS | 1986年 / 139卷 / 01期

关键词：

CRYSTALS - Defects - ELECTRIC CONDUCTIVITY - X-RAYS - Diffraction;

D O I：

10.1016/0040-6090(86)90043-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The electrical resistivity of Ni-Cr thin films with variable chromium contents (0-50 at. %) annealed to 300 degree C was measured. The structure was investigated by X-ray diffraction. The films consist of crystallites of gamma -Ni-Cr with stacking fault defects along the left bracket 111 right bracket direction, dependent on the chromium content. The sign of the temperature coefficient of the resistivity depends critically on the chromium content of the as-deposited films. The annealing behavior of the electrical resistivity could be correlated with structural transformations.

引用

页码：15 / 24

页数：10

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