USE OF A CARBON-ALLOYED GRADED-BAND-GAP LAYER AT THE P/I-INTERFACE TO IMPROVE THE PHOTOCHARACTERISTICS OF AMORPHOUS-SILICON ALLOYED P-I-N SOLAR-CELLS PREPARED BY PHOTOCHEMICAL VAPOR-DEPOSITION

被引:36
作者
KIM, WY
TASAKI, H
KONAGAI, M
TAKAHASHI, K
机构
关键词
D O I
10.1063/1.337806
中图分类号
O59 [应用物理学];
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页码:3071 / 3076
页数:6
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