RESISTIVE ELECTROSTATIC ION-CYCLOTRON INSTABILITY IN PLASMAS

被引：4

作者：

LEE, KF

LUHMANN, NC

机构：

[1] CHINESE UNIV HONG KONG,DEPT ELECTR,SHATIN,HONG KONG

[2] UNIV CALIF,ELECT SCI & ENGN DEPT,LOS ANGELES,CA 90024

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 1976年 / 4卷 / 01期

关键词：

D O I：

10.1109/TPS.1976.4316929

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

引用

页码：40 / 44

页数：5

共 18 条

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