Pulsed UV laser irradiation of polymer surfaces

被引：13
作者：
Hiraoka, H
机构：
来源：
JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY | 1995年 / 92卷 / 1-2期
关键词：
pulsed UV-laser irradiation; polymer surfaces; nano-structure fabrications; diamond deposition;
D O I：
10.1016/1010-6030(95)04165-7
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Pulsed UV lasers, such as the fourth harmonic emission of an Nd:YAG laser at 266 nm and an ArF excimer laser at 193 nm, were used to obtain modification of polymer surfaces, nanostructure fabrications on polymer and silicon substrates and diamond deposition using photoablated polymer plumes. The results are reported here.
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页码：129 / 133
页数：5
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