PREPARATION OF SIO2 OVERLAYERS ON OXIDE SUBSTRATES BY CHEMICAL VAPOR-DEPOSITION OF SI(OC2H5)4

被引：46

作者：

OKUHARA, T ^{[1
]}

WHITE, JM ^{[1
]}

机构：

[1] UNIV TEXAS,DEPT CHEM,AUSTIN,TX 78712

来源：

APPLIED SURFACE SCIENCE | 1987年 / 29卷 / 02期

关键词：

D O I：

10.1016/0169-4332(87)90005-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：223 / 241

页数：19

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