THIN-FILM FORMATION USING SINGLE-GRID ION-BEAM SPUTTERING

被引：4

作者：

NISHIMURA, C

YANAGISAWA, K

TAGO, A

TOSHIMA, T

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1987年 / 5卷 / 03期

关键词：

D O I：

10.1116/1.574157

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：343 / 346

页数：4

共 50 条

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