PROPERTIES AND MICROSTRUCTURE OF HOT ISOSTATICALLY PRESSED SI3N4

被引：11
|
作者：
YEHESKEL, O [1 ]
GEFEN, Y [1 ]
TALIANKER, M [1 ]
机构：
[1] NUCL RES CTR NEGEV,IL-84190 BEERSHEBA,ISRAEL
来源：
MATERIALS SCIENCE AND ENGINEERING | 1986年 / 78卷 / 02期
关键词：
D O I：
10.1016/0025-5416(86)90325-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：209 / 216
页数：8
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