HIGH-TC YBA2CU3O7-X THIN-FILMS ON SI SUBSTRATES BY DC MAGNETRON SPUTTERING FROM A STOICHIOMETRIC OXIDE TARGET

被引：62
作者：
LEE, WY
SALEM, J
LEE, V
HUANG, T
SAVOY, R
DELINE, V
DURAN, J
机构：
来源：
APPLIED PHYSICS LETTERS | 1988年 / 52卷 / 26期
关键词：
D O I：
10.1063/1.99771
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：2263 / 2265
页数：3
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WEAST RC, 1985, CRC HDB CHEM PHYSICS
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