ENHANCED SOFT-X-RAY EMISSION IN A DENSE-PLASMA FOCUS WITH ADDITIONAL HIGH-Z GAS PUFF

被引：11

作者：

KITAOKA, H

SAKURAI, A

YAMAMOTO, T

SHIMODA, K

HIRANO, K

机构：

[1] Department of Electronic Engineering, Gunma University, Gunma, Kiryu

来源：

JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN | 1995年 / 64卷 / 11期

关键词：

PLASMA FOCUS; HIGH Z GAS PUFF; SOFT X-RAYS; X-RAY SOURCE; HIGH DENSITY PLASMA; HIGH TEMPERATURE PLASMA;

D O I：

10.1143/JPSJ.64.4191

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

A plasma focus device with a fast acting valve is designed for additional high z gas puff and is successfully operated to produce intense soft X-rays. Using the fast acting valve, high z gas is injected to the pinch region just before the discharge to decouple the initial phase for the current sheath formation from the pinch formation phase. Quantitative measurement of soft X-ray intensity and the observation of the plasma behavior were simultaneously carried out for the additional gas puff discharge and the conventional gas-tilled discharge. Experimental results show the enhancement of the soft X-ray emission in two order of the intensity.

引用

页码：4191 / 4195

页数：5

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