ELECTRON YIELDS AND ESCAPE DEPTHS FROM KAPTON AND TEFLON

被引：16

作者：

YANG, KY ^{[1
]}

HOFFMAN, RW ^{[1
]}

机构：

[1] CASE WESTERN RESERVE UNIV,DEPT PHYS,CLEVELAND,OH 44106

来源：

SURFACE AND INTERFACE ANALYSIS | 1987年 / 10卷 / 2-3期

关键词：

D O I：

10.1002/sia.740100210

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：121 / 125

页数：5

共 22 条

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[10] ATTENUATION LENGTH FOR PHOTOELECTRONS EXCITED IN ALUMINUM BY 21.2-EV PHOTONS [J].

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