USE OF MISFIT STRAIN TO REMOVE DISLOCATIONS FROM EPITAXIAL THIN-FILMS

被引：295

作者：

MATTHEWS, JW ^{[1
]}

BLAKESLEE, AE ^{[1
]}

MADER, S ^{[1
]}

机构：

[1] IBM CORP THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

THIN SOLID FILMS | 1976年 / 33卷 / 02期

关键词：

D O I：

10.1016/0040-6090(76)90085-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：253 / 266

页数：14

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[9] MECHANISMS OF STRESS RELIEF IN THIN FILMS [J].

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[10]

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