STRAIN-INDUCED TWO-DIMENSIONAL ELECTRON-GAS IN SELECTIVELY DOPED SI/SIXGE1-X SUPERLATTICES

被引:438
作者
ABSTREITER, G [1 ]
BRUGGER, H [1 ]
WOLF, T [1 ]
JORKE, H [1 ]
HERZOG, HJ [1 ]
机构
[1] CLAREMONT MCKENNA COLL,FORSCHUNGSINST,CLAREMONT,CA 91711
关键词
D O I
10.1103/PhysRevLett.54.2441
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:2441 / 2444
页数:4
相关论文
共 18 条
[1]  
ABSTREITER G, 1976, PHYS REV B, V14, P2480, DOI 10.1103/PhysRevB.14.2480
[2]   EFFECT OF STATIC UNIAXIAL STRESS ON RAMAN SPECTRUM OF SILICON [J].
ANASTASSAKIS, E ;
PINCZUK, A ;
BURSTEIN, E ;
POLLAK, FH ;
CARDONA, M .
SOLID STATE COMMUNICATIONS, 1970, 8 (02) :133-+
[3]   INFLUENCE OF UNIAXIAL STRESS ON INDIRECT ABSORPTION EDGE IN SILICON AND GERMANIUM [J].
BALSLEV, I .
PHYSICAL REVIEW, 1966, 143 (02) :636-&
[4]   PSEUDOMORPHIC GROWTH OF GEXSI1-X ON SILICON BY MOLECULAR-BEAM EPITAXY [J].
BEAN, JC ;
SHENG, TT ;
FELDMAN, LC ;
FIORY, AT ;
LYNCH, RT .
APPLIED PHYSICS LETTERS, 1984, 44 (01) :102-104
[5]   GEXSI1-X/SI STRAINED-LAYER SUPERLATTICE GROWN BY MOLECULAR-BEAM EPITAXY [J].
BEAN, JC ;
FELDMAN, LC ;
FIORY, AT ;
NAKAHARA, S ;
ROBINSON, IK .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02) :436-440
[6]   INTRINSIC OPTICAL ABSORPTION IN GERMANIUM-SILICON ALLOYS [J].
BRAUNSTEIN, R ;
MOORE, AR ;
HERMAN, F .
PHYSICAL REVIEW, 1958, 109 (03) :695-710
[7]   RAMAN-SCATTERING FROM GEXSI1-X/SI STRAINED-LAYER SUPERLATTICES [J].
CERDEIRA, F ;
PINCZUK, A ;
BEAN, JC ;
BATLOGG, B ;
WILSON, BA .
APPLIED PHYSICS LETTERS, 1984, 45 (10) :1138-1140
[8]   EFFECTS OF INTERBAND EXCITATIONS ON RAMAN PHONONS IN HEAVILY DOPED N-SI [J].
CHANDRASEKHAR, M ;
RENUCCI, JB ;
CARDONA, M .
PHYSICAL REVIEW B, 1978, 17 (04) :1623-1633
[9]  
JORKE H, 1985, UNPUB P INT S SI MOL
[10]  
KASPER E, 1982, APPL PHYS A-MATER, V28, P129, DOI 10.1007/BF00617144