INITIAL-STAGES OF DEVELOPMENT OF THE SURFACE-TOPOGRAPHY INDUCED BY ION-BOMBARDMENT

被引：1
作者：
PRANEVICIUS, L
RAILA, S
VOSYLIUS, J
机构：
来源：
SURFACE & COATINGS TECHNOLOGY | 1994年 / 63卷 / 01期
关键词：
D O I：
10.1016/S0257-8972(05)80008-8
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The development of surface topography is conducted on the basis of consideration of the stochastic sputtering process. Elemental, inhomogeneous and multilayer structures are investigated. It is shown that in the case of multilayer structures the microscopic roughness of the surface depends significantly on the ratio of sputtering yields of contacting layers and on the interface properties. It is shown that ion beams can be employed for surface roughness control.
引用
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页码：57 / 63
页数：7
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