ELECTRON-TUNNELING EXPERIMENTS NEAR THE METAL-INSULATOR-TRANSITION

被引:1
作者
BRAKMANN, M [1 ]
EWERT, S [1 ]
机构
[1] TECH UNIV COTTBUS,INST PHYS,O-7500 COTTBUS,GERMANY
来源
PHYSICA B | 1994年 / 194卷
关键词
D O I
10.1016/0921-4526(94)90822-2
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Tunneling measurements of the electronic density of states N(E) on amorphous Ge1-xCr(x) and Si1-xCr(x) near the metal-insulator transition are reported. N(E) shows a square-root law in the energy dependence on the metallic side. The results are interpreted in terms of the electron-electron interaction in disordered materials. The range of the E1/2 dependence is the same for all chromium concentrations in each material. An E1/2 dependence can be seen for higher energies on the insulating side as well. Temperature dependent contributions to N(E) should be relevant only for energies smaller than 5 k(B)T.
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页码:985 / 986
页数:2
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