MASKLESS ETCHING OF A NANOMETER STRUCTURE BY FOCUSED ION-BEAMS

被引：52

作者：

KOMURO, M

HIROSHIMA, H

TANOUE, H

KANAYAMA, T

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期

关键词：

D O I：

10.1116/1.582719

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：985 / 989

页数：5

共 12 条

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[10]

KOMURO M, UNPUB APPL PHYS LETT

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