CHARACTERIZATION OF VAPOR-DEPOSITED TIN-DOPED INDIUM OXIDE-FILMS

被引:13
作者
ENLOE, JH [1 ]
WIRTZ, GP [1 ]
机构
[1] UNIV ILLINOIS,DEPT CERAM ENGN,URBANA,IL 61801
关键词
D O I
10.1149/1.2108972
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:1583 / 1587
页数:5
相关论文
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