THE INFLUENCE OF ISOTHERMAL HYDROGEN ANNEALING ON ELECTRICAL-PROPERTIES OF POLYCRYSTALLINE-SILICON FILMS

被引：2

作者：

LU, CY

TSAI, NS

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 04期

关键词：

D O I：

10.1149/1.2108691

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

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页码：847 / 849

页数：3

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