COMPARISON OF THE PROPERTIES OF HYDROGENATED MICROCRYSTALLINE SILICON FILMS DEPOSITED BY PHOTO CHEMICAL-VAPOR DEPOSITION AND GLOW-DISCHARGE DEPOSITION PROCESSES

被引：9
作者：
DUTTA, J
UNAOGU, AL
RAY, S
BARUA, AK
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 10期
关键词：
D O I：
10.1063/1.343829
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：4709 / 4714
页数：6
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