DYNAMIC SCALING OF ION-SPUTTERED SURFACES

被引:485
|
作者
CUERNO, R
BARABASI, AL
机构
[1] BOSTON UNIV,DEPT PHYS,BOSTON,MA 02215
[2] IBM CORP,TJ WATSON RES CTR,NEW YORK,NY 10598
关键词
D O I
10.1103/PhysRevLett.74.4746
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We derive a stochastic nonlinear equation to describe the evolution and scaling properties of surfaces eroded by ion bombardment. The coefficients appearing in the equation can be calculated explicitly in terms of the physical parameters characterizing the sputtering process. We find that transitions may take place between various scaling behaviors when experimental parameters, such as the angle of incidence of the incoming ions or their average penetration depth, are varied. © 1995 The American Physical Society.
引用
收藏
页码:4746 / 4749
页数:4
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