TEMPERATURE-DEPENDENCE OF THE GELATION OF SILICON ALKOXIDES

被引：43
作者：
COLBY, MW [1 ]
OSAKA, A [1 ]
MACKENZIE, JD [1 ]
机构：
[1] OKAYAMA UNIV,SCH ENGN,DEPT IND CHEM,NAKA KU,OKAYAMA 700,JAPAN
来源：
JOURNAL OF NON-CRYSTALLINE SOLIDS | 1988年 / 99卷 / 01期
关键词：
D O I：
10.1016/0022-3093(88)90465-6
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：129 / 139
页数：11
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