TEMPERATURE-DEPENDENCE OF THE GELATION OF SILICON ALKOXIDES

被引:43
作者
COLBY, MW [1 ]
OSAKA, A [1 ]
MACKENZIE, JD [1 ]
机构
[1] OKAYAMA UNIV,SCH ENGN,DEPT IND CHEM,NAKA KU,OKAYAMA 700,JAPAN
关键词
D O I
10.1016/0022-3093(88)90465-6
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:129 / 139
页数:11
相关论文
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