PHOTOLUMINESCENCE AND ANNEALING BEHAVIOR OF GA-DOPED CDTE CRYSTALS

被引:25
|
作者
SETO, S
TANAKA, A
SUZUKI, K
KAWASHIMA, M
机构
[1] Electronics Materials Laboratory, Sumitomo Metal Mining, Co., Ltd., Tokyo, 198, 1-6-1 Suehiro, Ohme
关键词
D O I
10.1016/0022-0248(90)91008-E
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Ga-doped CdTe crystals grown by the vertical gradient freeze method were studied by measuring high-resolution photoluminescence (PL) and electrical properties. Comparisons were made for as-grown and annealed samples under Cd saturation. The as-grown samples grown from slightly Te rich melt were of high resistivity (108 Ω cm) although gallium on the Te site alone in CdTe acts usually as a shallow donor. The Cd-annealed samples, on the other hand, were n-type with low resistivity. A new prominent PL line at 1.5841 eV was found in the high-resistivity as-grown crystals. Furthermore, the 1.5841 eV line completely disappeared after Cd annealing. These results suggest that the luminescence center related to the 1.5841 eV line is a Cd-vacancy/gallium associated and is responsible for high resistivity. This is direct evidence to explain the high-resistivity mechanism due to so-called self-compensation in CdTe(Ga). The two-electron transitions in Ga donors measured by PL are also reported. © 1989.
引用
收藏
页码:430 / 434
页数:5
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