SURFACE PHOTOCHEMICAL PHENOMENA IN LASER CHEMICAL VAPOR-DEPOSITION

被引:32
作者
HIGASHI, GS
ROTHBERG, LJ
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 05期
关键词
D O I
10.1116/1.582966
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
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页码:1460 / 1463
页数:4
相关论文
共 17 条
[1]   UV PHOTODISSOCIATION AND PHOTODESORPTION OF ADSORBED MOLECULES .1. CH3BR ON LIF(001) [J].
BOURDON, EBD ;
COWIN, JP ;
HARRISON, I ;
POLANYI, JC ;
SEGNER, J ;
STANNERS, CD ;
YOUNG, PA .
JOURNAL OF PHYSICAL CHEMISTRY, 1984, 88 (25) :6100-6103
[2]   DIRECT OBSERVATION OF THE LOCAL-FIELD-ENHANCED SURFACE PHOTOCHEMICAL-REACTIONS [J].
CHEN, CJ ;
OSGOOD, RM .
PHYSICAL REVIEW LETTERS, 1983, 50 (21) :1705-1708
[3]   LASER-INDUCED GAS-SURFACE INTERACTIONS [J].
Chuang, T. J. .
SURFACE SCIENCE REPORTS, 1983, 3 (01) :1-105
[4]   LASER MICROPHOTOCHEMISTRY FOR USE IN SOLID-STATE ELECTRONICS [J].
EHRLICH, DJ ;
OSGOOD, RM ;
DEUTSCH, TF .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1980, 16 (11) :1233-1243
[5]   SPATIALLY DELINEATED GROWTH OF METAL-FILMS VIA PHOTOCHEMICAL PRE-NUCLEATION [J].
EHRLICH, DJ ;
OSGOOD, RM ;
DEUTSCH, TF .
APPLIED PHYSICS LETTERS, 1981, 38 (11) :946-948
[6]  
EHRLICH DJ, 1983, J VAC SCI TECHNOL B, V1, P969, DOI 10.1116/1.582718
[7]   CHEMICAL VAPOR-DEPOSITION ON SILICON - INSITU SURFACE STUDIES [J].
FOORD, JS ;
JACKMAN, RB .
CHEMICAL PHYSICS LETTERS, 1984, 112 (02) :190-194
[8]   ENHANCED PHOTOFRAGMENTATION ON A SILVER SURFACE [J].
GONCHER, GM ;
HARRIS, CB .
JOURNAL OF CHEMICAL PHYSICS, 1982, 77 (07) :3767-3768
[9]   INFRARED SPECTRA OF TRIMETHYL ALUMINUM, DIMETHYL ALUMINUM CHLORIDE, METHYL ALUMINUM DICHLORIDE, METHYL TITANIUM TRICHLORIDE, DIMETHYL TITANIUM DICHLORIDE, AND SOME DEUTERIUM DERIVATIVES [J].
GRAY, AP .
CANADIAN JOURNAL OF CHEMISTRY-REVUE CANADIENNE DE CHIMIE, 1963, 41 (06) :1511-&
[10]   VIBRATIONAL SPECTROSCOPY OF GROWTH SURFACES DURING PHOTOCHEMICAL DEPOSITION OF ALUMINUM FROM TRIMETHYLALUMINUM VAPOR [J].
HIGASHI, GS ;
ROTHBERG, LJ ;
FLEMING, CG .
CHEMICAL PHYSICS LETTERS, 1985, 115 (02) :167-172