INTERFACIAL REACTIONS OF NI-TA THIN-FILMS ON GAAS

被引：24

作者：

LAHAV, A ^{[1
]}

EIZENBERG, M ^{[1
]}

机构：

[1] TECHNION ISRAEL INST TECHNOL,INST SOLID STATE,IL-32000 HAIFA,ISRAEL

来源：

APPLIED PHYSICS LETTERS | 1984年 / 45卷 / 03期

关键词：

D O I：

10.1063/1.95203

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：256 / 258

页数：3

共 14 条

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[5]

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[7] CONTACT REACTIONS IN PD-GAAS JUNCTIONS [J].

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HO, PS ;

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JOURNAL OF APPLIED PHYSICS, 1979, 50 (02) :955-962

[8] CONTACT REACTION BETWEEN SI AND PD-W ALLOY-FILMS [J].

OLOWOLAFE, JO ;

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JOURNAL OF APPLIED PHYSICS, 1979, 50 (10) :6316-6320

[9]

OTTAVIANI G, 1980, APPL PHYS LETT, V36, P1331

[10] INTERACTION OF EVAPORATED PALLADIUM THIN-FILMS WITH GALLIUM-ARSENIDE [J].

OUSTRY, A ;

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THIN SOLID FILMS, 1981, 79 (03) :251-256

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