A SIMPLIFIED FOCUSING AND DEFLECTION SYSTEM WITH VERTICAL BEAM LANDING

被引：5

作者：

KURODA, K

OZASA, S

KOMODA, T

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期

关键词：

D O I：

10.1116/1.582734

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1303 / 1306

页数：4

共 11 条

[1]

ASAI S, 1980, J VAC SCI TECHNOL, V16, P1710

[2] VARIABLY SHAPED ELECTRON-BEAM LITHOGRAPHY SYSTEM, EB55 .1. SYSTEM-DESIGN [J].

FUJINAMI, M ;

MATSUDA, T ;

TAKAMOTO, K ;

YODA, H ;

ISHIGA, T ;

SAITOU, N ;

KOMODA, T .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :941-945

[3]

Fujinami M., 1981, International Electron Devices Meeting, P566

[4]

GOTO E, 1977, OPTIK, V48, P255

[5]

HOSOKAWA T, 1980, OPTIK, V56, P21

[6] OPTIMIZATION OF ELECTRON-PROBE FORMING SYSTEMS WITH RESPECT TO ABERRATIONS AND VERTICAL BEAM LANDING [J].

KERN, DP .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1686-1691

[7]

KURODA K, 1983, OPTIK, V64, P125

[8]

Munro E., 1973, IMAGE PROCESSING COM, P284

[9]

OHIWA H, 1971, ELECTRON COMMUN JPN, V54, P44

[10] ADVANCED DEFLECTION CONCEPT FOR LARGE AREA, HIGH-RESOLUTION E-BEAM LITHOGRAPHY [J].

PFEIFFER, HC ;

LANGNER, GO .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1058-1063

← 1 2 →