HIGH-TEMPERATURE ANNEALING EFFECTS ON TIN OXIDE-FILMS

被引：22

作者：

SUNDARAM, KB ^{[1
]}

BHAGAVAT, GK ^{[1
]}

机构：

[1] INDIAN INST TECHNOL, DEPT ELECT ENGN, BOMBAY 400076, INDIA

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1983年 / 16卷 / 01期

关键词：

D O I：

10.1088/0022-3727/16/1/011

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：69 / 76

页数：8

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