X-RAY-DIFFRACTION STUDIES OF ANNEALED CZOCHRALSKI-GROWN SILICON .1. DOUBLE-CRYSTAL DIFFRACTOMETRY

被引:3
|
作者
JOKSCH, S
ZAUMSEIL, P
ZULEHNER, W
机构
[1] DESY,HAMBURGER SYNCHROTRONSTRAHLUNGSLABOR,W-2000 HAMBURG 52,GERMANY
[2] INST HALBLEITERPHYS,O-1200 FRANKFURT,GERMANY
[3] WACKER CHEMITRON GMBH,O-8263 BURGHAUSEN,GERMANY
关键词
D O I
10.1107/S0021889892009956
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
X-ray reflection properties are reported of annealed Czochralski-grown silicon (ACS) single crystals at photon energies between 8 and 50 keV, studied by double- and triple-crystal diffractometry (DCD and TCD, respectively) and with X-radiation from sealed-tube sources. The report is divided into two parts. In this paper (paper I), the results of double-crystal topography and rocking-curve measurements are discussed in detail with regard to the application of ACS for the monochromatization of synchrotron X-radiation in the above-mentioned energy range. The analysis of the defects which enhance the reflectivity of ACS compared with that of perfect float-zone-grown silicon, carried out by TCD measurements and transmission electron microscopy, is presented in the following paper (paper II).
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页码:185 / 191
页数:7
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