A MODEL OF THE CHEMICAL PROCESSES OCCURRING IN CF-4/O2 DISCHARGES USED IN PLASMA-ETCHING

被引：277

作者：

PLUMB, IC

RYAN, KR

机构：

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 1986年 / 6卷 / 03期

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D O I：

10.1007/BF00575129

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

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页码：205 / 230

页数：26

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