MAGNETIC-PROPERTIES OF CO-NI-MG-N THIN-FILMS

被引：7
作者：
GEORGESCU, V
机构：
[1] Al. I. Cuza University, Faculty of Physics, Bd. Copou No. 11, Iasi
来源：
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1994年 / 27卷 / 01期
关键词：
THIN FILMS; FILM DEPOSITION;
D O I：
10.1016/0921-5107(94)90148-1
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The effect was investigated of nitrogen content on the magnetic properties (B-s, H-c, B-r/B-s), microhardness H-V and microstructure of Co-Ni-Mg-N thin films (450 nm) in the composition range 0-16 at.% N, 82-66 at.% Co, 4 at.% Mg, balance Ni. The films were electroplated onto an Al substrate with a 50 nm Ni buffer layer. They are of practical use as longitudinal recording media (H-c=70 kA m(-1), B-r/B-s=0.95-0.98, H-V=19.5x10(8) Pa, for films containing 8-10 at.% N).
引用
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页码：17 / 21
页数：5
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