ION-BEAM ENHANCED DEPOSITION OF TITANIUM-NITRIDE ON INCONEL 718

被引：4
作者：
SRIDHARAN, K
WALTER, KC
CONRAD, JR
机构：
[1] Plasma Source Ion Implantation Program, University of Wisconsin - Madison, Madison, WI 53706
来源：
MATERIALS RESEARCH BULLETIN | 1991年 / 26卷 / 05期
基金：
美国国家科学基金会;
关键词：
COATINGS; TITANIUM; NITRIDES;
D O I：
10.1016/0025-5408(91)90050-V
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A wear-resistant titanium-nitride film was successfully formed on the commercial superalloy INCONEL 718 with a plasma source ion-implantation unit operated in the ion-beam enhanced-deposition mode. The process was carried out at ambient temperature by alternately depositing titanium with a dc cathode sputter source followed by nitrogen implantation utilizing a plasma. Auger spectroscopy was used to determine the composition-depth profile of the surface film. Transmission electron microscopy indicated the film to be adherent and fine-grained. Tribological property improvements are attributed to both higher hardness and lower coefficient of friction of the titanium-nitride film.
引用
收藏
页码：367 / 373
页数：7
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