2 TYPES OF MEV ION-BEAM ENHANCED ADHESION FOR AU FILMS ON SIO2

被引:25
作者
WIE, CR
SHI, CR
MENDENHALL, MH
LIVI, RP
VREELAND, T
TOMBRELLO, TA
机构
关键词
D O I
10.1016/0168-583X(85)90771-2
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:20 / 24
页数:5
相关论文
共 10 条
[1]  
FLEISCHER RL, 1975, NUCLEAR TRACKS SOLID
[2]   ION-BEAM-ENHANCED ADHESION IN THE ELECTRONIC STOPPING REGION [J].
GRIFFITH, JE ;
QIU, Y ;
TOMBRELLO, TA .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1982, 198 (2-3) :607-609
[3]   NON-REGISTERED SILICON PRODUCED AT A METAL SILICON INTERFACE BY 14 MEV OXYGEN IONS [J].
HEADRICK, RL ;
SEIBERLING, LE .
APPLIED PHYSICS LETTERS, 1984, 45 (04) :388-390
[4]  
JACOBSON S, 1983, UPPSALA U PREPRINT
[5]  
MENDENHALL MH, 1983, THESIS CALTECH
[6]  
Primak W, 1975, COMPACTED STATES VIT
[7]  
SARIS FW, 1983, COMMUNICATION
[8]   FAST CHEMISTRY IN ION WAKES [J].
TOMBRELLO, TA .
INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1983, 53 (SEP) :307-316
[9]  
TOMBRELLO TA, 1984, THIN SOLID FILMS
[10]   ENHANCED ADHESION FROM HIGH-ENERGY ION IRRADIATION [J].
WERNER, BT ;
VREELAND, T ;
MENDENHALL, MH ;
QUI, Y ;
TOMBRELLO, TA .
THIN SOLID FILMS, 1983, 104 (1-2) :163-166