HETEROEPITAXIAL GROWTH OF Y-BA-CU-O/BI-SR-CU-O/Y-BA-CU-O

被引：12
|
作者：
HARADA, K
TANAKA, S
ITOZAKI, H
YAZU, S
机构：
[1] Itami Research Laboratories, Sumitomo Electric Ind Ltd., Itami, Hyogo, 664
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1990年 / 29卷 / 07期
关键词：
Bi-sr-cu-o; Heteroepitaxy; Heterostructure; Inter face; Oxide superconductor; Thin-film; Y-ba-cu-o;
D O I：
10.1143/JJAP.29.L1114
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Heteroepitaxial films of YBa2Cu3O7-x/Bi2Sr2CuOy/YBa2Cu3O7-x have been successfully grown using the in situ process. The RHEED pattern of each layer observed in situ showed streaks. The result of cross-sectional transmission electron micrograph (TEM) observation indicates virtually no disruption at the interfaces with the 6 nm-thick intermediate layer. Temperature dependence of resistance through the trilayer also indicates that there is no disruption which would cause short passes for supercurrent between the top and base superconducting layers. © 1990 The Japan Society of Applied Physics.
引用
收藏
页码：L1114 / L1116
页数：3
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