CHARACTERISTICS OF DEFECT FORMATION IN EPITAXIAL GALLIUM-ARSENIDE CONTAINING INDIUM ISOVALENT IMPURITIES

被引:0
作者
KOLCHENKO, TI
LOMAKO, VM
RODIONOV, AV
SVESHNIKOV, YN
机构
来源
SOVIET PHYSICS SEMICONDUCTORS-USSR | 1989年 / 23卷 / 04期
关键词
D O I
暂无
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
引用
收藏
页码:391 / 393
页数:3
相关论文
共 50 条
[41]   IDENTIFICATION OF RESIDUAL DONOR IMPURITIES IN GALLIUM-ARSENIDE [J].
LOW, TS ;
STILLMAN, GE ;
WOLFE, CM .
INSTITUTE OF PHYSICS CONFERENCE SERIES, 1982, (63) :143-148
[42]   BREAKDOWN CHARACTERISTICS OF GALLIUM-ARSENIDE [J].
BALIGA, BJ ;
EHLE, R ;
SHEALY, JR ;
GARWACKI, W .
ELECTRON DEVICE LETTERS, 1981, 2 (11) :302-304
[43]   NATIVE OXIDE GLASSES FOR INDIUM GALLIUM-ARSENIDE [J].
GRODKIEWICZ, WH ;
OBRYAN, HM ;
PASTEUR, GA ;
PRESSMAN, L ;
SINGH, S ;
VANUITERT, LG ;
ZYDZIK, G .
MATERIALS RESEARCH BULLETIN, 1981, 16 (04) :373-376
[44]   PHOTOLUMINESCENCE SPECTRA OF EPITAXIAL FILMS OF GALLIUM-ARSENIDE [J].
MARONCHUK, YE ;
SHERSTYAKOV, AP ;
SHERSTYAKOVA, VN .
SOVIET PHYSICS SEMICONDUCTORS-USSR, 1973, 6 (08) :1400-1401
[45]   POLAROGRAPHIC-DETERMINATION OF INDIUM IN GALLIUM-ARSENIDE [J].
LANZA, P ;
ZANNONI, C .
ANNALI DI CHIMICA, 1988, 78 (1-2) :49-54
[46]   ELECTRON PHONON INTERACTIONS IN INDIUM GALLIUM-ARSENIDE [J].
NASH, KJ ;
SKOLNICK, MS ;
BASS, SJ .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1987, 2 (06) :329-336
[47]   BARRIER OHMIC CONTACTS TO INDIUM GALLIUM-ARSENIDE [J].
MELLOR, PJT ;
HERNIMAN, J .
FIRST INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS FOR ADVANCED ELECTRONIC AND OPTICAL DEVICES, 1989, 1144 :347-353
[48]   ANALYSIS OF MOBILITY IN EPITAXIAL GALLIUM-ARSENIDE FILMS [J].
KRAVCHENKO, AF ;
MOROZOV, BV ;
SKOK, EM .
SOVIET PHYSICS SEMICONDUCTORS-USSR, 1973, 6 (11) :1831-1834
[49]   STRUCTURAL INHOMOGENEITIES IN GALLIUM-ARSENIDE EPITAXIAL LAYERS [J].
ASTAKHOV, VM ;
ZALETIN, VM ;
SIDOROV, YG ;
STENIN, SI .
THIN SOLID FILMS, 1976, 32 (02) :343-345
[50]   RECOMBINATION PROPERTIES OF GALLIUM-ARSENIDE EPITAXIAL STRUCTURES [J].
KOROTOV, VF ;
STANEV, N ;
KHITKO, VI ;
YANCHENKO, AM .
ZHURNAL TEKHNICHESKOI FIZIKI, 1990, 60 (06) :170-171