SOME FACTORS AFFECTING DEPTH PROFILING MEASUREMENTS USING AUGER-ELECTRON SPECTROSCOPY

被引:12
作者
HOOKER, MP [1 ]
GRANT, JT [1 ]
机构
[1] UNIVERSAL ENERGY SYST INC,MEDWAY,OH 45341
关键词
D O I
10.1016/0039-6028(75)90259-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:328 / 332
页数:5
相关论文
共 3 条
[1]   COMPARISON OF AUGER-SPECTRA OF MG, AL, AND SI EXCITED BY LOW-ENERGY ELECTRON AND LOW-ENERGY ARGON-ION BOMBARDMENT [J].
GRANT, JT ;
HOOKER, MP ;
SPRINGER, RW ;
HAAS, TW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01) :481-484
[2]  
GRANT JT, TO BE PUBLISHED
[3]   USE OF AUGER-ELECTRON SPECTROSCOPY AND INERT-GAS SPUTTERING FOR OBTAINING CHEMICAL PROFILES [J].
PALMBERG, PW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01) :160-&