THE DIRECT PHOTOCHEMICAL VAPOR-DEPOSITION OF SIO2 FROM SI2H6 AND N2O3 MIXTURES

被引：12

作者：

BHATNAGAR, YK

MILNE, WI

机构：

来源：

THIN SOLID FILMS | 1989年 / 168卷 / 02期

关键词：

D O I：

10.1016/0040-6090(89)90018-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：345 / 352

页数：8

共 14 条

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