STRUCTURAL-ANALYSIS OF ELECTROLESS DEPOSITS IN THE DIFFUSION-LIMITED REGIME

被引：48
作者：
KUHN, A
ARGOUL, F
MUZY, JF
ARNEODO, A
机构：
[1] Centre de Recherche Paul Pascal, 33600 Pessac, Avenue Schweitzer
来源：
PHYSICAL REVIEW LETTERS | 1994年 / 73卷 / 22期
关键词：
D O I：
10.1103/PhysRevLett.73.2998
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
We discuss the actual relevance of thin gap geometry electrodeposition to generate fractal patterns that mimic the morphology of Witten and Sander's diffusion-limited aggregates (DLA). We show that electroless deposition is a good candidate to meet the requirements for diffusion to be the rate limiting step of the growth process. We use the wavelet transform microscope to provide a comparative structural characterization of both experimental electroless deposits and numerical DLA clusters. © 1994 The American Physical Society.
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页码：2998 / 3001
页数：4
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