APPLIED STRESSES, CYCLOTRON MASSES AND CHARGE-DENSITY-WAVES IN SILICON INVERSION LAYERS

被引:24
作者
KELLY, MJ [1 ]
FALICOV, LM [1 ]
机构
[1] UNIV CAMBRIDGE,CAVENDISH LAB,CAMBRIDGE CB3 OHE,ENGLAND
关键词
D O I
10.1016/0038-1098(77)90122-3
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
引用
收藏
页码:447 / 450
页数:4
相关论文
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