MICRO-PATTERNING OF PBZRXTI1-XO3 THIN-FILMS PREPARED BY PHOTO SENSITIVE SOL-GEL SOLUTION

被引：31

作者：

NAKAO, Y ^{[1
]}

NAKAMURA, T ^{[1
]}

HOSHIBA, K ^{[1
]}

SAMESHIMA, K ^{[1
]}

KAMISAWA, A ^{[1
]}

ABE, K ^{[1
]}

SOYAMA, N ^{[1
]}

OGI, K ^{[1
]}

机构：

[1] MITSUBISHI MAT CORP,CENT RES INST,OMIYA,SAITAMA 330,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 9B期

关键词：

SOL-GEL; PHOTO SENSITIVE; PZT; FERROELECTRIC; EXCIMER LASER;

D O I：

10.1143/JJAP.32.4141

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The photo sensitivity of sol-gel solution of PbZrxTi1-xO3 (PZT) was studied. A coated film of the sol-gel solution on Pt/Ti/SiO2/Si substrates was exposed to an excimer laser and developed with water. The film was finally annealed at 700-degrees-C for 60 s by rapid thermal annealing (RTA). Ferroelectric perovskite phase was observed in the PZT thin films. The 130-nm-thick film showed P(r) of 11.2 muC/cm2 and E(c) of 93.8 kV/cm. From this process, half-micron patterns of PZT films were obtained.

引用

页码：4141 / 4143

页数：3

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