ION-ASSISTED DEPOSITION OF BULKLIKE ZRO2 FILMS

被引：30

作者：

MARTIN, PJ

NETTERFIELD, RP

SAINTY, WG

CLARK, GJ

LANFORD, WA

SIE, SH

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

[2] SUNY ALBANY,DEPT PHYS,ALBANY,NY 12222

[3] CSIRO,DIV MINERAL PHYS,N RYDE,NSW 2113,AUSTRALIA

来源：

APPLIED PHYSICS LETTERS | 1983年 / 43卷 / 08期

关键词：

D O I：

10.1063/1.94485

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：711 / 713

页数：3

共 8 条

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[4]

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[5] ION-BEAM-ASSISTED DEPOSITION OF THIN-FILMS [J].

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MACLEOD, HA ;

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PACEY, CG ;

SAINTY, WG .

APPLIED OPTICS, 1983, 22 (01) :178-184

[6]

MURANOVA GA, 1977, SOV J OPT TECHNOL+, V44, P682

[7] PROPERTIES OF OPTICAL FILM MATERIALS [J].

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APPLIED OPTICS, 1981, 20 (01) :21-25

[8] REFRACTIVE-INDEX OF CUBIC ZIRCONIA STABILIZED WITH YTTRIA [J].

WOOD, DL ;

NASSAU, K .

APPLIED OPTICS, 1982, 21 (16) :2978-2981

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