NOISE-MARGIN LIMITATIONS ON GALLIUM-ARSENIDE VLSI

被引:5
作者
LONG, SI
SUNDARAM, M
机构
关键词
D O I
10.1109/4.339
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:893 / 900
页数:8
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CRAIGHEAD, HG .
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