INSITU INFRARED REFLECTION ABSORPTION SPECTROSCOPIC CHARACTERIZATION OF PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITED SIO2-FILMS

被引：52

作者：

KOLLER, KB ^{[1
]}

SCHMIDT, WA ^{[1
]}

BUTLER, JE ^{[1
]}

机构：

[1] USN,RES LAB,DIV CHEM,GAS SURFACE DYNAM SECT,CODE 6174,WASHINGTON,DC 20375

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 09期

关键词：

D O I：

10.1063/1.341207

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4704 / 4710

页数：7

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