PHOTODEGRADATION OF CIS-1,4-POLYISOPRENE SENSITIZED BY ADDITION OF CHLORONITROSO COMPOUNDS

被引：4

作者：

RABEK, JF

机构：

来源：

关键词：

D O I：

10.1002/app.1965.070090609

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：2121 / &

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