AN ATOMISTIC STUDY OF THE GAAS-PD INTERFACE

被引:15
作者
KOBAYASHI, A [1 ]
SAKURAI, T [1 ]
HASHIZUME, T [1 ]
SAKATA, T [1 ]
机构
[1] UNIV OSAKA PREFECTURE, COLL INTEGRATED ARTS & SCI, SAKAI, OSAKA 591, JAPAN
关键词
D O I
10.1063/1.336813
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:3448 / 3453
页数:6
相关论文
共 33 条
[1]   SURFACE STOICHIOMETRY AND STRUCTURE OF GAAS [J].
ARTHUR, JR .
SURFACE SCIENCE, 1974, 43 (02) :449-461
[2]   THE STRUCTURE AND PROPERTIES OF METAL-SEMICONDUCTOR INTERFACES [J].
Brillson, L. J. .
SURFACE SCIENCE REPORTS, 1982, 2 (02) :123-326
[3]   MEASUREMENT AND MODULATION OF ATOMIC INTER-DIFFUSION AT AU-AL-GAAS(110) INTERFACES [J].
BRILLSON, LJ ;
MARGARITONDO, G ;
STOFFEL, NG ;
BAUER, RS ;
BACHRACH, RZ ;
HANSSON, G .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (05) :880-885
[4]   ATOMIC MODULATION OF INTER-DIFFUSION AT AU-GAAS INTERFACES [J].
BRILLSON, LJ ;
MARGARITONDO, G ;
STOFFEL, NG .
PHYSICAL REVIEW LETTERS, 1980, 44 (10) :667-670
[5]   ELECTRONIC PROPERTIES OF SILICON-TRANSITION METAL INTERFACE COMPOUNDS [J].
Calandra, C. ;
Bisi, O. ;
Ottaviani, G. .
SURFACE SCIENCE REPORTS, 1985, 4 (5-6) :271-364
[6]   APPLICATION OF HIGH-ENERGY ION CHANNELING TO GAAS(110), AU-GAAS(110) AND PD-GAAS(110) [J].
GOSSMANN, HJ ;
GIBSON, WM .
SURFACE SCIENCE, 1984, 139 (01) :239-259
[7]  
Hansen M., 1958, J ELECTROCHEM SOC, DOI DOI 10.1149/1.2428700
[8]  
Hashizume T., UNPUB
[9]  
JIMBO A, UNPUB
[10]   FERMI ENERGY PINNING BEHAVIOR AND CHEMICAL-REACTIVITY OF THE PD/GAAS (110) INTERFACE [J].
KENDELEWICZ, T ;
PETRO, WG ;
PAN, SH ;
WILLIAMS, MD ;
LINDAU, I ;
SPICER, WE .
APPLIED PHYSICS LETTERS, 1984, 44 (01) :113-115