A SIMPLE, CONTROLLABLE SOURCE FOR DOSING MOLECULAR HALOGENS IN UHV

被引：156

作者：

SPENCER, ND ^{[1
]}

GODDARD, PJ ^{[1
]}

DAVIES, PW ^{[1
]}

KITSON, M ^{[1
]}

LAMBERT, RM ^{[1
]}

机构：

[1] UNIV CAMBRIDGE,DEPT PHYS CHEM,CAMBRIDGE CB2 1EP,ENGLAND

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 03期

关键词：

D O I：

10.1116/1.572185

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1554 / 1555

页数：2

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