INCREASED OPTICAL-DAMAGE RESISTANCE IN LITHIUM-NIOBATE

被引:605
作者
BRYAN, DA
GERSON, R
TOMASCHKE, HE
机构
[1] UNIV MISSOURI,ROLLA,MO 65401
[2] GREENVILLE COLL,GREENVILLE,IL 62246
关键词
D O I
10.1063/1.94946
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:847 / 849
页数:3
相关论文
共 5 条
[1]   2-PHOTON HOLOGRAPHIC RECORDING WITH CONTINUOUS-WAVE LASERS IN THE 750-1100-NM RANGE [J].
BRAUCHLE, C ;
WILD, UP ;
BURLAND, DM ;
BJORKLUND, GC ;
ALVAREZ, DC .
OPTICS LETTERS, 1982, 7 (04) :177-179
[2]  
BRYAN DA, 1983, SPIE P, V380, P261
[3]   PHOTOREFRACTIVE EFFECT [J].
GLASS, AM .
OPTICAL ENGINEERING, 1978, 17 (05) :470-479
[4]   PHOTOREFRACTIVE EFFECTS AND PHOTOCONDUCTIVITY IN LINBO3-FE [J].
KRATZIG, E .
FERROELECTRICS, 1978, 21 (1-4) :635-636
[5]  
ZHONG GG, 1980, 11TH P INT QUANT EL, P631