THIN STACKED OXIDE NITRIDE OXIDE DIELECTRICS FORMATION BY INSITU MULTIPLE REACTIVE RAPID THERMAL-PROCESSING

被引：9
作者：
TING, W
LIN, SN
KWONG, DL
机构：
来源：
APPLIED PHYSICS LETTERS | 1989年 / 55卷 / 22期
关键词：
D O I：
10.1063/1.102359
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：2313 / 2315
页数：3
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