FABRICATION OF SUPERCONDUCTING YBA2CU3O7-DELTA SUBMICRON STRUCTURES

被引：10

作者：

BARTH, R ^{[1
]}

SPANGENBERG, B ^{[1
]}

LANGHEINRICH, W ^{[1
]}

ALBRECHT, W ^{[1
]}

KURZ, H ^{[1
]}

GIERES, G ^{[1
]}

HOLZAPFEL, B ^{[1
]}

机构：

[1] SIEMENS AG,ZENT ABT FORSCH & ENTWICKLUNG,W-8520 ERLANGEN,GERMANY

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1992年 / 10卷 / 06期

关键词：

D O I：

10.1116/1.577793

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Submicron structures of superconducting YBa2Cu3O7-delta (delta < 0.1) are fabricated by high-energy electron-beam lithography in combination with Ar/O2 ion-beam etching. A novel three-level resist system of platinum/titanium/PMMA is developed to minimize the process-induced loss of superconductivity. Bridges as narrow as 150 nm with lengths between 0.3 and 4 mum have been fabricated, retaining their superconductivity without reloading with oxygen. Possible reasons for process-induced deterioration of superconducting properties are discussed.

引用

页码：3411 / 3413

页数：3

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