LOCAL-FIELD METHOD FOR RESISTIVITY AND ELECTROMIGRATION IN METALLIC MICROSTRUCTURES - APPLICATION TO THIN-FILMS

被引：33

作者：

CHU, CS ^{[1
]}

SORBELLO, RS ^{[1
]}

机构：

[1] UNIV WISCONSIN,SURFACE STUDIES LAB,MILWAUKEE,WI 53201

来源：

PHYSICAL REVIEW B | 1988年 / 38卷 / 11期

关键词：

D O I：

10.1103/PhysRevB.38.7260

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：7260 / 7274

页数：15

相关论文

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